Patterning

Shadow Masking

• We design stainless steel shadow masks to pattern thin films during deposition.
• We will convert any drawing (CAD, JPEG, TIFF, etc.) into the appropriate format for mask fabrication.

Photolithography

• High resolution patterning over large areas is achieved using a combination of photo-lithography and lift-off or chemical etching.
• Photo masks are designed in-house according to customer specifications.

FIB Milling

• Ion milling and micromachining can be done in-situ during SEM imaging.
• Highest resolution patterning can be achieved using in-situ SEM lithography.

Reactive Ion Etching (RIE)

• Many materials can be patterned by reactive ion plasma etching using patterned photoresist as a mask.