Patterning
![substrata-web-400px](https://i0.wp.com/substratasolutions.com/wp-content/uploads/2021/05/substrata-web-400px.jpg?resize=400%2C106&ssl=1)
![](https://i0.wp.com/substratasolutions.com/wp-content/uploads/2019/12/Custom-Patterning.jpg?w=1080&ssl=1)
![Gold-Coated-Silicon-Chips-(10-mm-x-10-mm)---Au-500-A---20-pkg_2](https://i0.wp.com/substratasolutions.com/wp-content/uploads/2020/05/Gold-Coated-Silicon-Chips-10-mm-x-10-mm-Au-500-A-20-pkg_2.png?resize=600%2C388&ssl=1)
Shadow Masking
- We design stainless steel shadow masks to pattern thin films during deposition.
- We will convert any drawing (CAD, JPEG, TIFF, etc.) into the appropriate format for mask fabrication.
Photolithography
- High resolution patterning over large areas is achieved using a combination of photo-lithography and lift-off or chemical etching.
- Photo masks are designed in-house according to customer specifications.
FIB Milling
- Ion milling and micromachining can be done in-situ during SEM imaging.
- Highest resolution patterning can be achieved using in-situ SEM lithography.
Reactive Ion Etching (RIE)
- Many materials can be patterned by reactive ion plasma etching using patterned photoresist as a mask.
Looking for custom substrates or coatings?
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