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Shadow Masking

  • We design stainless steel shadow masks to pattern thin films during deposition.
  • We will convert any drawing (CAD, JPEG, TIFF, etc.) into the appropriate format for mask fabrication.



  • High resolution patterning over large areas is achieved using a combination of photo-lithography and lift-off or chemical etching.
  • Photo masks are designed in-house according to customer specifications.


FIB Milling

  • Ion milling and micromachining can be done in-situ during SEM imaging.
  • Highest resolution patterning can be achieved using in-situ SEM lithography.


Reactive Ion Etching (RIE)

  • Many materials can be patterned by reactive ion plasma etching using patterned photoresist as a mask.

Looking for custom substrates or coatings?

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