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TITANIUM NITRIDE (TiN) COATED PRODUCTS

Substrata offers a full suite of titanium nitride coated silicon and glass

Angstrom Engineering has developed an effective low-temperature method for depositing ultra-pure, highly dense, and conductive TiN (~ 50-70 µΩ·cm) thin films onto glass and silicon substrates. This is achieved using a new reactive Bipolar High Power Impulse Magnetron Sputtering (Bi-HiPIMS) technology. HiPIMS uses pulsed power at very high peak power density that yields a high ionization of sputtered species. A positive reverse voltage is applied immediately after the normal negative HiPIMS pulse (“Bipolar” HiPIMS) which accelerates these ions towards the substrate surface while simultaneously exposing them to reactive N2 gas. This ion bombardment on the surface of the growing film is essential for creating a high-quality and dense TiN coating without needing to rely on extreme temperatures often required for more traditional sputtering methods.

Titanium nitride (TiN) thin films have an excellent thermal and bio stability, strength, and resistance to corrosion under extreme conditions. TiN is often applied as an effective hard coating on steel, carbide, and aluminum components. It is also used to protect sliding surfaces, as a tribological layer for cutting tools, and is an excellent non-toxic coating found in biomedical devices. Thin film TiN is also used in microelectronics, serving as both a metal and silicon diffusion layer and an excellent conductive connection between active devices and metal contacts. There is also significant research effort into the understanding of TiN superconducting properties that vary with sample preparation and temperature. Custom sizes and materials can also be fabricated to meet your needs.

For General Inquiries:

Titanium Nitride (TiN) Coated Silicon

P-type <100>, SSP, Prime Grade

High quality substrates coated with 500 Å (50 nm) of titanium nitride. An adhesion layer between the substrate surface and the titaniuim nitride coating is available upon request.

Product #DescriptionCoatingThicknessAdhesionUnitLead Time/StockPrice
(USD)
Order
4WTN-00500-Q3Titanium Nitride Coated Ø4 in Silicon Wafers
500 Å TiN | Ø101.6 mm x 0.525 mm thick
Titanium Nitride (99.995 %)500 ÅNone3/pkg1 week$1,625.00

Add to cart

DescriptionThicknessPrice
(USD)
OrderCoatingAdhesionUnitLead Time/StockProduct #
Titanium Nitride Coated Ø4 in Silicon Wafers
500 Å TiN | Ø101.6 mm x 0.525 mm thick
500 Å$1,625.00

Add to cart

Titanium Nitride (99.995 %)None3/pkg1 week4WTN-00500-Q3

Titanium Nitride (TiN) Coated Glass

Borosilicate, Ultra Flat

High quality substrates coated with 500 Å (50 nm) of titanium nitride. An adhesion layer between the substrate surface and the titaniuim nitride coating is available upon request.

Product #DescriptionCoatingThicknessAdhesionUnitLead Time/StockPrice
(USD)
Order
SSTN-00500-Q10Titanium Nitride Coated Microscope Slides
500 Å TiN | 25 mm x 75 mm x 1 mm
Titanium Nitride (99.995 %)500 ÅNone10/pkg1 week$1,625.00

Add to cart

DescriptionThicknessPrice
(USD)
OrderCoatingAdhesionUnitLead Time/StockProduct #
Titanium Nitride Coated Microscope Slides
500 Å TiN | 25 mm x 75 mm x 1 mm
500 Å$1,625.00

Add to cart

Titanium Nitride (99.995 %)None10/pkg1 weekSSTN-00500-Q10

Looking for custom substrates or coatings?

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