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Alpha Tantalum Coated Ø4 in High Resistivity Silicon Wafer | 2000 Å α-Ta | 1/pkg

Alpha Tantalum Coated Ø4 in High Resistivity Silicon Wafer | 2000 Å α-Ta | 1/pkg

$1,450.00 USD

  • Substrate: Ø4 Float-Zone (FZ) Silicon Wafer, Undoped, <100>, > 6,000 Ω·cm, 525 ± 25 µm Thick, TTV: <10 µm, Bow/Warp: <30 µm, SSP, 1 SEMI Std.
  • Film Phase: α-Tantalum (BCC structure)
  • Deposition Method: High-Vacuum Magnetron Sputtering (Cleanroom Fabricated)
  • Film Thickness: 2000 Å
  • Typical Resistivity: ~ 20 µΩ·cm (room temp)
  • Pack Size: 1/pkg
  • Coating Area: Single Side; 5 mm edge exclusion
  • Lead Time: 2-3 weeks
SKU: 4HRTA-02000-Q1 Category:

Our Alpha-phase Tantalum (α-Ta) films on high-resistivity silicon are engineered for applications that demand exceptional film quality, uniformity, and reproducible material performance. Utilizing High-Vacuum Magnetron Sputtering within a tightly controlled cleanroom environment, we produce films with excellent phase purity and highly consistent properties across the wafer.

We start with premium 4-inch Float-Zone (FZ) Silicon wafers featuring a <100> crystal orientation and resistivity greater than 6,000 Ω·cm. These intrinsic, undoped substrates offer exceptional electrical isolation and material purity, while their tightly controlled geometry and polished surface provide a stable foundation for high-quality thin-film growth. Unlike conventional room-temperature deposition processes, our high-temperature sputtering approach provides the thermal energy necessary to promote the formation of stable α-phase Tantalum. Enhanced surface mobility during growth improves film crystallinity, reduces defects, and delivers the low-resistivity material properties associated with this highly desirable phase.

  • High-Purity, High-Resistivity Substrate Platform: Float-zone silicon minimizes impurity concentrations and provides a reliable foundation for advanced thin-film applications.
  • Optimized High-Temperature Growth: Elevated deposition temperatures promote α-phase formation and improved crystalline quality, resulting in highly uniform and reproducible films.
  • High Material Quality: Careful process control ensures excellent thickness uniformity and repeatable material performance across the entire 4-inch wafer.

 

At Angstrom Engineering we take pride in offering high quality Substrata products and services at affordable prices.

Questions? Please email us at [email protected] or call our toll free line at 1 519.894.4441.